search:pecvd shower head相關網頁資料
-
-
![電漿輔助化學氣相沉積(PECVD) - 駿佳科技首頁]()
www.junjia.com.tw電漿輔助化學氣相沉積 Model: PECVD-Clip Series Plasma Enhanced Chemical Vapor Deposition (PECVD) 規格: 一. 綜合說明: 腔體上蓋板上掀式設計，手動放置晶片, ...瀏覽：308 -
![PECVD, Plasma Deposition, Plasma Enhanced Chemical Vapor Deposition - Technology]()
www.oxfordplasma.deOxford Plasma Technology: Technology for plasma depostion (PECVD) ... Typical Applications: interlayer dielectric passivation layer optical waveguides mask for ion implantation free standing low stress membranes瀏覽：944
pecvd shower head的相關文章
pecvd shower head的相關商品
瀏覽：1495
日期：2024-04-20
AMAT- 60k TFS PECVD (CVD) Spec AC Power Voltage: 440v 50/60hz Power (Max): 1,000 KW Power (Ave): 760 KW avg Water PCW flow (max): 43 m 3/h DI flow (max): 5 m 3/h DI flow (ave): 4.5 m 3/h Gases SiH4, H2, N2, Ar, CH4, TMB, PH3, NF3, He Physical ......
瀏覽：664
日期：2024-04-20
Dual PECVD&RIE System with Load-Locks and ICP Source Chamber with Plasma Source Platen with Plasma We offer Planar Plasma Sources NPE-4000 Platen inside the Chamber 700 0 C Platen NANO-MASTER, Inc. PECVD systems are ......
瀏覽：936
日期：2024-04-22
3 Deposition Techniques Epitaxy ¾VPE, LPE, MBE Physical Vapor Deposition (PVD) ¾evaporator, sputter Chemical Vapor Deposition (CVD) ¾APCVD, SACVD, LPCVD, PECVD, HDPCVD, UHVCVD, MOCVD, photon-enhanced CVD, Jet Vapor Deposition ......
瀏覽：851
日期：2024-04-25
Oxford Plasma Technology: Technology for dry etching, plasma etching (RIE) ... typical process pressure: 5 - 150 mtorr plasma density: ca 1 - 5 x 10 9 / cm 2 standard method for most applications RF ("self") bias forms at the substrate electrode...
瀏覽：515
日期：2024-04-23
駿佳科技有限公司成立於 2007 年 5 月,其成員具多年機械設計與製造經驗,結合半導體製程,尤其是在電漿設備,自動化設備及半導體業設備的消耗性零件具開發與整合的能力,可提供客戶: 電漿設備 - 活性離子蝕刻機 (RIE/HDPRIE)...
Effects of Deposition Method of PECVD Silicon Nitride as MIM Capacitor Dielectric for GaAs HBT Techn
瀏覽：902
日期：2024-04-22
In this study, we have depositedand characterized various PECVD silicon nitride films for MIM capacitor dielectric applications in GaAs HBT technology. We have compared the properties of single layer and multilayer films,- deposited under the same process...
瀏覽：1304
日期：2024-04-19
1. Plasma-surface interactions and plasma systems Film growth in the energetic plasma environment 2. Hard protective PECVD coatings From tribological coatings for aerospace and automobile to biomedical applications 3. Optical and multifuntional coatings F...
瀏覽：595
日期：2024-04-25
6 11 電漿增強化學氣相沈積法 PECVD 使用SiH4 和NO2 (笑氣) e−+ SiH 4 → SiH2 + 2H + e− e−+ N 2O → N2 + O + e− SiH2 + 3O → SiO2 + H2O 電漿增強化學反應 PECVD 可以在較低的溫度下達到較高的沈積 速率 12 Mean Free Path vs. Plasma Stability...
網友正在看
![[7 11] iPhone iPad 限時免費及減價 Apps 精選推介](https://www.iarticlesnet.com/pub/img/article/5263/1403809768417_xs.jpg)
熱門 活動與組務 文章
