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Plasma Etching - RIT - People - Home
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日期：2026-04-25
© April 17, 2013 Dr. Lynn Fuller Rochester Institute of Technology Microelectronic Engineering Plasma Etching Page 2 OUTLINE Introduction Plasma Etching Metrics – Isotropic, Anisotropic, Selectivity, Aspect Ratio, Etch Bias Plasma and Wet Etch Summary The...看更多
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