Characteristic of SiO2 Films Deposited by Using Low ...

Characteristic of SiO2 Films Deposited by Using Low ...

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日期:2025-09-28
chemical vapor deposition (PECVD) driven by an inductively coupled plasma (ICP) for ... We found that the SiO2 deposited using by PECVD with TEOS/N2/O2....看更多