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  LMDC Catalogue: Vacuum Equipment Page
  
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  The Foundations of Vacuum Coating Technology
  
  The Foundations of Vacuum Coating Technology vii Preface Vacuum coating processes consist of a source of vapor (atomic or molecular) of the material to be deposited, transport of the vapor to the surface to be coated, and condensation on the surface to fo
  
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Arcing in Very Large Area Plasma-Enhanced Chemical ...

日期：2025-06-21

This thesis presents an investigation into arcing and parasitic plasmas in .... (PECVD) is the fabrication of thin-film transistor (TFT) displays and pho- tovoltaic ......

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Microarcing instability in RF PECVD plasma system

日期：2025-06-22

2004年11月18日 - Microarcing at the chamber wall in RF plasma is studied in PECVD type ... The arcing frequency strongly depends on the plasma potential, the....

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Optimizing Chemical Vapor Deposition Processing Through ...

日期：2025-06-21

The PECVD deposition begins with a stabilization step, where the process ..... A more severe arcing problem will exhibit itself as much larger drops in all five ......

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Quality Management by APC in Large Area PECVD

日期：2025-06-23

Tool and recipe. Layers on chamber wall, tool aging, arcing, particle. Dimensions (reactor), gas flow rates, pumping speed ... Gas flow rates and pumping speed....

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Microarcing instability in RF PECVD plasma system ...

日期：2025-06-20

This system and procedure allows us to create reproducibly microarcings by increasing the plasma potential. The wall arcing threshold of the plasma potential in ......

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PECVD Reactors

日期：2025-06-17

PECVD Reactors. - Tube or 'runnel reacTors. — Induc'rive or ... Thermionic Arc: The enhanced emission is due To. exTernal heaTing and is less abrupT and ......

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