SiO2 PECVD and RIE for waveguides - Oxford Plasma Technology RIE PECVD Ion Beam Sputtering

SiO2 PECVD and RIE for waveguides - Oxford Plasma Technology RIE PECVD Ion Beam Sputtering

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日期:2025-12-09
Oxford Plasma Technology: SiO2 PECVD and RIE for waveguides ... Dr Hoffmann uses his Plasmalab 80 DP/ RIE Master/ Slave system for depositing SiO 2 for waveguides and for etching this film very anisotropically or with a shaped wall....看更多