Fundamentals of Plasma Etching Part 1 – Focus on the ...

Fundamentals of Plasma Etching Part 1 – Focus on the ...

瀏覽:1358
日期:2025-12-10
Why we use RF excited plasmas. • The Capacitive Coupled Plasma (CCP). • How the rf current across sheath leads the DC bias. • Why controlling DC bias is ......看更多