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        © April 17, 2013 Dr. Lynn Fuller Rochester Institute of Technology Microelectronic Engineering Plasma Etching Page 2 OUTLINE Introduction Plasma Etching Metrics – Isotropic, Anisotropic, Selectivity, Aspect Ratio, Etch Bias Plasma and Wet Etch Summary The
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      • www.me.ntut.edu.tw
        2006年4月12日 - Dark spaces or sheath regions. 2006/4/12. 44. DC Bias of Etch Chamber Plasma. DC bias. 0 time. Wafer Potential. Plasma potential. Self bias ...
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